Session
Unveiling Precision: Mastering the Art of Mask Manufacturing and Hotspot Detection
Session Chairs
DescriptionJoin us at the forefront of semiconductor manufacturing. Delve into how language modeling techniques can be used for hotspot detection in chip layouts via semantic encoding. Discover strategies for co-optimizing source and masks in an efficient manner. Learn about the integration of correlation-aware strategies and reinforcement learning to enhance mask optimization. Explore advancements in inverse lithography technology (ILT) that account for mask writing realities, and appreciate elegant methods for accelerating ILT computations, promising reductions in turnaround time without sacrificing pattern fidelity.
This session is a deep dive into the latest methodologies and technologies in photomask design, optimization, and manufacturing.
This session is a deep dive into the latest methodologies and technologies in photomask design, optimization, and manufacturing.
Event TypeResearch Manuscript
TimeWednesday, June 261:30pm - 3:00pm PDT
Location3004, 3rd Floor
Design
Design for Manufacturability and Reliability
Presentations
1:30pm - 1:45pm PDT | Efficient Bilevel Source Mask Optimization | |
1:45pm - 2:00pm PDT | Efficient ILT via Multigrid-Schwartz Method | |
2:00pm - 2:15pm PDT | LLM-HD: Layout Language Model for Hotspot Detection with GDS Semantic Encoding* | |
2:15pm - 2:30pm PDT | CAMO: Correlation-Aware Mask Optimization with Modulated Reinforcement Learning | |
2:30pm - 2:45pm PDT | EMOGen: Enhancing Mask Optimization via Pattern Generation | |
2:45pm - 3:00pm PDT | Fracturing-aware Curvilinear ILT via Circular E-beam Mask Writer |