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DTSTAMP:20240626T180033Z
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DTSTART;TZID=America/Los_Angeles:20240626T144500
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UID:dac_DAC 2024_sess145_RESEARCH714@linklings.com
SUMMARY:Fracturing-aware Curvilinear ILT via Circular E-beam Mask Writer
DESCRIPTION:Research Manuscript\n\nXinyun Zhang, Su Zheng, Guojin Chen, an
 d Binwu Zhu (The Chinese University of Hong Kong); Hong Xu (City Universit
 y of Hong Kong); and Bei Yu (The Chinese University of Hong Kong)\n\nInver
 se lithography technology (ILT) is vital in optical proximity correction, 
 tending to generate curvilinear masks for optimal process windows. Traditi
 onal curvilinear mask manufacturing involves fracturing into rectangles, r
 equiring expensive mask write times. A novel E-beam mask writer that write
 s variable radius circles per shot significantly reduces the shot count fo
 r curvilinear masks. We present two methods to generate circular fracturin
 g-aware masks. The first one converts pixel-based masks from existing ILT 
 methods into circle-based masks using predefined rules. The second one int
 egrates circular constraints into the ILT process, generating circle-based
  masks directly via optimization. Extensive experimental results validate 
 both approaches' effectiveness.\n\nTopic: Design\n\nKeyword: Design for Ma
 nufacturability and Reliability\n\nSession Chairs: Shao-Yun Fang (National
  Taiwan University of Science and Technology) and Biying Xu (The Hong Kong
  University of Science and Technology (Guangzhou))
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