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DTSTAMP:20240626T180035Z
LOCATION:3004\, 3rd Floor
DTSTART;TZID=America/Los_Angeles:20240626T133000
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UID:dac_DAC 2024_sess145_RESEARCH756@linklings.com
SUMMARY:Efficient Bilevel Source Mask Optimization
DESCRIPTION:Research Manuscript\n\nGuojin Chen (The Chinese University of 
 Hong Kong), Hongquan He (Shanghai Tech University), Peng Xu (The Chinese U
 niversity of Hong Kong), Hao Geng (Shanghai Tech University), and Bei Yu (
 The Chinese University of Hong Kong)\n\nResolution Enhancement Techniques 
 (RETs) are critical to meet the demands of advanced technology nodes. Amon
 g RETs, Source Mask Optimization (SMO) is pivotal, concurrently optimizing
  both the source and the mask to expand the process window. Traditional SM
 O methods, however, are limited by sequential and alternating optimization
 s, leading to extended runtimes without performance guarantees. This paper
  introduces a unified SMO framework utilizing the accelerated Abbe forward
  imaging to enhance precision and efficiency. Further, we propose the inno
 vative \texttt{BiSMO} framework, which reformulates SMO through a bilevel 
 optimization approach, and present three gradient-based methods to tackle 
 the challenges of bilevel SMO. Our experimental results demonstrate that \
 texttt{BiSMO} achieves a remarkable 40\% reduction in error metrics and 8$
 \times$ increase in runtime efficiency, signifying a major leap forward in
  SMO.\n\nTopic: Design\n\nKeyword: Design for Manufacturability and Reliab
 ility\n\nSession Chairs: Shao-Yun Fang (National Taiwan University of Scie
 nce and Technology) and Biying Xu (The Hong Kong University of Science and
  Technology (Guangzhou))
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