Presentation
Efficient ILT via Multigrid-Schwartz Method
DescriptionInverse lithography technology (ILT) is one of most powerful resolution enhancement technologies (RETs) used in chip manufacturing. Due to the high computational requirements of ILT, large layouts are often split into smaller tiles and then assembled to obtain the final result. This paper states the challenges that may emerge during layout assembly and proposes to use the multigrid Schwarz method to address these issues. Experimental results show that our method achieves comparable quality results to full-chip correction and exhibits better efficiency.
Event Type
Research Manuscript
TimeWednesday, June 261:45pm - 2:00pm PDT
Location3004, 3rd Floor
Design
Design for Manufacturability and Reliability