Session

DescriptionJoin us at the forefront of semiconductor manufacturing. Delve into how language modeling techniques can be used for hotspot detection in chip layouts via semantic encoding. Discover strategies for co-optimizing source and masks in an efficient manner. Learn about the integration of correlation-aware strategies and reinforcement learning to enhance mask optimization. Explore advancements in inverse lithography technology (ILT) that account for mask writing realities, and appreciate elegant methods for accelerating ILT computations, promising reductions in turnaround time without sacrificing pattern fidelity.
This session is a deep dive into the latest methodologies and technologies in photomask design, optimization, and manufacturing.